EDITOR: | October 30th, 2013

Potash Minerals Ltd.: Resignation of Ben Binninger as CEO

| October 30, 2013 | No Comments

Potash-Minerals-LimitedOctober 30, 2013 (Source: Potash Minerals Ltd.) — Highlights:

  • Ben Binninger, CEO Citadel Capital Holdings I nc, Steps Down
  • Technical Project Manager Being Sought to Drive Hatch Point Potash Project to Next Phase

Potash Minerals Limited (ASX: POK) advises that Mr Ben Binninger has stepped down as Chief Executive Officer of the Company’s 100% owned US subsidiary, Citadel Capital Holdings Inc. The Company is now looking to appoint a new executive with a strong technical project management background to drive the project through Its next phase.

Since taking up the position of CEO in May 2011, Mr Binninger has successfully led the Company through the early stages of development of the K20 Utah Hatch Point Potash Project in Utah. Some of the important milestones achieved include the permitting and drilling of 3 holes on Utah State land, securing BLM (U.S Bureau of Land Management) approval to drill on Federal land and the recent announcement of the Company’s maiden JORC Resource at the Hatch Point Potash Project. The Company is now well positioned to embark on its next Important stage of development which will focus on advancing the project feasibility studies and the Federal drilling programme. The Company wishes to express Its appreciation for Mr Binnlnger’s significant contribution over the past 2 years.

In the interests of preserving the vast corporate knowledge and good will he has generated for the Company over the past 2 years, Mr Blnnlnger has agreed to remain a Non-Executive Director of Potash Minerals Limited and will assist with the transition to a new executive.

Raj Shah


Raj Shah has professional experience working for over a half a dozen years at financial firms such as Merrill Lynch and First Allied Securities Inc., ... <Read more about Raj Shah>

Copyright © 2018 InvestorIntel Corp. All rights reserved. More & Disclaimer »

Leave a Reply

Your email address will not be published. Required fields are marked *